Nowadays there are more than 100 EUV machines running in the customer factory and basically all customers are using BaseLiner overlay to correct for overlay drift. This internship is mainly to investigate: What are the physical contributors to scanner overlay drift? What are the drift rate for each contributors? Are there any customer or factory specific drift behavior due to their use cases? From this internship, you will learn EUV lithography machine overlay knowledge and gain a broader overview of different hardware modules. You will also learn about how ASML setup a machine before shipping to customer and how we maintain its performance via drift control strategy. As for hands-on experience, you will deploy your matlab skills to do mathematical scripting and toolbox development. And you will also have a chance to apply statistics knowledge to interpret real scanner population data and link them to a physical mechanism by talking to other departments within ASML.